THRESHOLD VOLTAGE THEORY FOR A SHORT-CHANNEL MOSFET USING A SURFACE-POTENTIAL DISTRIBUTION MODEL

被引:19
作者
OMURA, Y
OHWADA, K
机构
[1] Musashino Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation, 180, Musashino shi
关键词
D O I
10.1016/0038-1101(79)90009-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A detailed expression of the threshold voltage for a short-channel MOSFET is derived from a model of surface-potential distribution under the gate using a relationship of surface-channel charge neutrality. The theory is compared with the measured threshold voltages. The theoretical curves for threshold voltage over a wide range of drain and backgate voltage are in good agreement with experimental results. It is shown for a MOSFET having a channel length less than 2 μm that the body-bias constant increases as the drain voltage increases. The theory also predicts that the increase in backgate voltage leads to the reduction in short-channel effect for the shorter-channel case. © 1979.
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页码:1045 / 1051
页数:7
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