LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES

被引：141

作者：

DEUTSCH, TF

EHRLICH, DJ

OSGOOD, RM

机构：

[1] Lincoln Laboratory, Massachusetts Institute of Technology, Lexington

来源：

APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 02期

关键词：

D O I：

10.1063/1.91026

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Metal deposits with features smaller than 2 μm have been produced by the uv laser-induced photodissociation of organometallic compounds. Such laser-induced heterogeneous photochemical processes may have application in several areas of microelectronics including metallization, etching, and growth of semiconductor films.

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页码：175 / 177

页数：3

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