FIELD-INDUCED SURFACE-CHEMISTRY OF NO

被引：44

作者：

KREUZER, HJ

WANG, LC

机构：

[1] Department of Physics, Dalhousie University, Halifax

来源：

JOURNAL OF CHEMICAL PHYSICS | 1990年 / 93卷 / 08期

关键词：

D O I：

10.1063/1.459494

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A microscopic theory of field adsorption is used to study the adsorption and reaction of NO on a Pt(111) surface in high electrostatic fields. We find that below 0.4 V/Å only NO is adsorbed stably. Above this value dissociation sets in that leads around 1.2 V/Å to the formation of N 2O. A molecular orbital analysis is given of the reaction pathway and to identify the stabilization mechanism. © 1990 American Institute of Physics.

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页码：6065 / 6069

页数：5

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