A TIME-AVERAGE MODEL OF THE RF PLASMA SHEATH

被引：40

作者：

ECONOMOU, DJ

EVANS, DR

ALKIRE, RC

机构：

[1] UNIV ILLINOIS,DEPT CHEM ENGN,URBANA,IL 61801

[2] TEKTRONIX INC,BEAVERTON,OR 97077

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 03期

关键词：

ION ENERGY - PARALLEL PLATE REACTOR - PLASMA REACTORS - RF PLASMA SHEATH - TIME-AVERAGE MODEL;

D O I：

10.1149/1.2095737

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

(Edited Abstract)

引用

页码：756 / 763

页数：8

共 28 条

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