GIANT PHOTOEXPANSION IN AS2S3 GLASS

被引：196

作者：

HISAKUNI, H

TANAKA, K

机构：

[1] Department of Applied Physics, Faculty of Engineering, Hokkaido University

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 23期

关键词：

D O I：

10.1063/1.112533

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

When illuminated with a focused beam from He-Ne lasers, As 2S3 films with thickness of ∼50 μm exhibit the thickness expansion reaching to 3 μm, which is approximately 10 times as great as that expected from the conventional photoexpansion phenomenon. The enhancement seems to be caused by photorelaxation of strain generated by photoexpansion. © 1994 American Institute of Physics.

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页码：2925 / 2927

页数：3

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