ELECTROLESS PLATING THROUGH SUCCESSIVE PRETREATMENT WITH AMINOSILANE AND PDCL2

被引：15

作者：

HAMAYA, T

KUMAGAI, Y

KOSHIZAKI, N

KANBE, T

机构：

来源：

CHEMISTRY LETTERS | 1989年 / 08期

关键词：

D O I：

10.1246/cl.1989.1461

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：1461 / 1464

页数：4

共 13 条

[1]

BEHRNDT ME, 1972, J VAC SCI TECHNOL, V8, P724

[2] CHEMISTRY OF PALLADIUM-TIN COLLOID SENSITIZING PROCESSES [J].

COHEN, RL ;

MEEK, RL .

JOURNAL OF COLLOID AND INTERFACE SCIENCE, 1976, 55 (01) :156-162

[3]

DEMINJER CH, 1973, J ELECTROCHEM SOC, V120, P1644

[4] NUCLEATION REACTION ON PHOTOSENSITIVE TIO2 FILMS [J].

KELLY, JJ ;

VONDELING, JK .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (08) :1103-1107

[5]

KUMAGAI Y, 1985, J JPN SOC COMPOS MAT, V11, P15

[6]

KUMMER G, 1972, INORG CHEM, V11, P296

[7] A STUDY ON ACTIVATION AND ACCELERATION BY MIXED PDCL2-SNCL2 CATALYSTS FOR ELECTROLESS METAL-DEPOSITION [J].

OSAKA, T ;

TAKEMATSU, H ;

NIHEI, K .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (05) :1021-1029

[8]

OSAKA T, 1982, DENKI KAGAKU, V50, P418

[9]

RANTELL A, 1974, PLATING, V61, P326

[10] NUCLEATION, GROWTH, AND STRUCTURE OF ELECTROLESS COPPER DEPOSITS [J].

SARD, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) :864-&

← 1 2 →