UTILIZATION OF MOS GATE STRUCTURE FOR CAPACITIVE CHARGE DIVISION READOUT OF SILICON STRIP DETECTOR

被引:6
作者
TAJIMA, H [1 ]
NAKAMURA, M [1 ]
NAKANISHI, S [1 ]
NIWA, K [1 ]
TANAKA, H [1 ]
YAMAMOTO, K [1 ]
机构
[1] HAMAMATSU PHOTON KK,DIV SOLID STATE,HAMAMATSU,JAPAN
关键词
D O I
10.1016/0168-9002(90)90149-Z
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We have developed a new method to supply bias voltage to the floating strips of a silicon strip detector by utilizing MOS gate structure. The voltage of the floating strips is controlled by the voltage of the MOS gate. © 1990.
引用
收藏
页码:536 / 540
页数:5
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