INTERNAL-STRESS IN ALUMINUM-OXIDE, TITANIUM CARBIDE AND COPPER-FILMS OBTAINED BY PLANAR MAGNETRON SPUTTERING

被引：25

作者：

KUWAHARA, K

SUMOMOGI, T

KONDO, M

机构：

来源：

THIN SOLID FILMS | 1981年 / 78卷 / 01期

关键词：

D O I：

10.1016/0040-6090(81)90416-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：41 / 47

页数：7

共 17 条

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[8]

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[9] STRESS IN VACUUM-DEPOSITED FILMS OF AG, AU, AND CU [J].

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[10] STRESSES IN SPUTTER-DEPOSITED NICKEL AND COPPER-OXIDE THIN-FILMS [J].

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