THIN-FILM MAGNETIC SENSOR USING HIGH-FREQUENCY MAGNETO-IMPEDANCE (HFMI) EFFECT

被引:59
作者
SENDA, M
ISHII, O
KOSHIMOTO, Y
TOSHIMA, T
机构
[1] NTT Interdisciplinary Research Laboratories, Tokai, Ibaraki
关键词
D O I
10.1109/20.334165
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This study reports on the performance of a thin-film magnetic sensor which uses the high frequency magneto-impedance (HFMI) effect. In order to obtain a high sensitivity and a large voltage change ratio (Delta V pp/V pp(0) : corresponds to the MR ratio), a strip pattern, a closed magnetic circuit, and a NIFe/SIO2 multilayer film structure are adopted for the magnetic films of the sensor. A Delta V pp/V PP(0) of 60-70 % is achieved by applying an external magnetic field of several Oe. Moreover there is no hysteresis or no Barkhausen noise in this sensor, which has a magnetic film width of 10 mu m. In terms of linearity, the sensor exhibits modulation degree (m) of 12 % and a total harmonic distortion (THD) of 0.8 %.
引用
收藏
页码:4611 / 4613
页数:3
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