PHOTOOXIDATION OF SULFENIC ACID-DERIVATIVES .1. SULFENAMIDES - THE SURPRISING BEHAVIOR OF A NEW CLASS OF PHOTOOXIDATION SUBSTRATES

被引:22
作者
CLENNAN, EL
ZHANG, HW
机构
[1] Department of Chemistry, University of Wyoming, Laramie
关键词
D O I
10.1021/ja00081a068
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
[No abstract available]
引用
收藏
页码:809 / 810
页数:2
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