KINETICS OF ELECTROLESS COPPER PLATING .3. MASS-TRANSPORT EFFECTS

被引：23

作者：

DONAHUE, FM

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 01期

关键词：

D O I：

10.1149/1.2129638

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：51 / 55

页数：5

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共 33 条

[1] A CONTRIBUTION TO THEORY OF ELECTROLYTIC CHLORATE FORMATION
BECK, TR
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1038 - &
[2] BENNETT CO, 1974, MOMENTUM HEAT MASS T, P561
[3] BENNETT CO, 1974, MOMENTUM HEAT MASS T, P486
[4] Donahue F. M., 1973, PLATING, V60, P135
[5] DONAHUE FM, UNPUBLISHED
[6] DUMESIC J, 1974, J ELCHEM SO, V121, P1504
[7] IONIC MASS TRANSFER AND CONCENTRATION POLARIZATION AT ROTATING ELECTRODES
EISENBERG, M
TOBIAS, CW
WILKE, CR
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1954, 101 (06) : 306 - 320
[8] ELECTROCHEMISTRY OF ELECTROLESS DEPOSITION OF COPPER
ELRAGHY, SM
ABOSALAMA, AA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (02) : 171 - 176
[9] EFFECT OF GAS EVOLUTION ON RATE OF MASS-TRANSFER AT VERTICAL ELECTRODES
FOUAD, MG
SEDAHMED, GH
[J]. ELECTROCHIMICA ACTA, 1972, 17 (04) : 665 - &
[10] Goldie W., 1964, PLATING, V51, P1069

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