HOLDING CHARACTERISTIC OF DARK STATE IN ANTIFERROELECTRIC LIQUID-CRYSTAL

被引：3

作者：

HAYASHI, H ^{[1
]}

TAKEMURA, M ^{[1
]}

YAMADA, Y ^{[1
]}

KIKUCHI, K ^{[1
]}

TAKIGAWA, K ^{[1
]}

INATA, M ^{[1
]}

HIJIKATA, Y ^{[1
]}

EZAKA, K ^{[1
]}

SINDO, H ^{[1
]}

ORIHARA, H ^{[1
]}

ISHIBASHI, Y ^{[1
]}

机构：

[1] NAGOYA UNIV,FAC ENGN,SYNTHET CRYSTAL RES LAB,CHIKUSA KU,NAGOYA,AICHI 46401,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 9B期

关键词：

ANTIFERROELECTRIC LIQUID CRYSTAL; SMECTIC C-A(ASTERISK); HOLDING CHARACTERISTIC OF DARK STATE; CONTRAST; MHPOBC AND ITS HOMOLOGS;

D O I：

10.1143/JJAP.33.5494

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The holding characteristic of the dark state of antiferroelectric liquid crystal (AFLC) displays have a crucial effect on the contrast ratio. We have studied the dependence of the transmittance in the dark state on the waveform of the applied voltage in multiplex driving for several materials. The samples used were 4-(1-methylheptyloxycarbonyl)phenyl-4'-octyloxybiphenyl-4-carboxylate (MHPOBC) and its homologues. It was found that the holding characteristics of the dark state are affected by the applied waveforms and the chemical structures such as the type of chiral radical and the length of the alkyl chain.

引用

页码：5494 / 5497

页数：4

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