CONTINUOUS DISCHARGE IMPROVES THE PERFORMANCE OF THE CU-CUCL DOUBLE PULSE LASER

被引：4

作者：

KUSHNER, MJ

CULICK, FEC

机构：

[1] California Institute of Technology, Pasadena

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1979年 / 15卷 / 09期

关键词：

D O I：

10.1109/JQE.1979.1070243

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A continuous glow discharge was applied to a Cu/CuCl double pulse laser. Maximum laser pulse energy was observed to increase as much as 35 percent at low buffer gas pressure and 3.5 percent at optimum buffer gas pressure. Minimum and optimum time delays decreased with increasing glow discharge current. The greater pulse energy may be due to increased rate of current rise of the pumping discharge pulse, and decreased contribution to the population of metastable copper from ion recombination. © 1979 IEEE

引用

页码：835 / 837

页数：3

共 11 条

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[5] Anderson R.S., Springer L.W., Bricks B.G., Karras T.W., A discharge heated copper vapor laser, IEEE J. Quantum Electron., QE-11, pp. 56D-57D, (1975)
[6] Vetter A.A., Quantitative effect of initial current rise on pumping the double-pulsed copper chloride laser, IEEE J. Quantum Electron., QE-13, pp. 889-891, (1977)
[7] Kushner M.J.
[8] Vetter A.A.
[9] Biondi M.A., Recombination, Principles of Laser Plasmas, (1976)
[10] Kushner M.J., Culick F.E.C., Extrema of electron density and output pulse energy in a CuCl/Ne discharge and a Cu/CuCl double-pulsed laser, Appl. Phys. Lett., 33, (1978)

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