PLASMA RETURN CURRENT DISCHARGE

被引:10
作者
MANGANO, JA
HSIA, J
JACOB, JH
SRIVASTAVA, BN
机构
[1] Avco Everett Research Laboratory, Inc., Everett
关键词
D O I
10.1063/1.90434
中图分类号
O59 [应用物理学];
学科分类号
摘要
A discharge technique based on the use of an electron-beam-induced plasma return current to produce and heat large-volume plasmas is described. The results of discharge studies using this technique in attachment-dominated mixtures are presented. The results are found to be adequately described by a simple theory. The electron attachment rate by F2 inferred from these measurements agrees well with those of other workers. KrF laser action at 248 nm is reported in return-current discharge-excited mixtures of F 2/Kr/He.
引用
收藏
页码:487 / 489
页数:3
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