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CONSIDERATION ON CHEMICAL-SHIFT FOR THIN INSULATING FILMS AS MEASURED BY ESCA
被引:8
作者
:
IWATA, S
论文数:
0
引用数:
0
h-index:
0
IWATA, S
ISHIZAKA, A
论文数:
0
引用数:
0
h-index:
0
ISHIZAKA, A
机构
:
来源
:
JOURNAL OF THE JAPAN INSTITUTE OF METALS
|
1978年
/ 42卷
/ 10期
关键词
:
D O I
:
10.2320/jinstmet1952.42.10_1020
中图分类号
:
学科分类号
:
摘要
:
引用
收藏
页码:1020 / 1021
页数:2
相关论文
共 2 条
[1]
Johansson G., 1973, Journal of Electron Spectroscopy and Related Phenomena, V2, P295, DOI 10.1016/0368-2048(73)80022-2
[2]
X-RAY PHOTOELECTRON-SPECTROSCOPY OF SIO2-SI INTERFACIAL REGIONS - ULTRATHIN OXIDE-FILMS
[J].
RAIDER, SI
论文数:
0
引用数:
0
h-index:
0
机构:
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
RAIDER, SI
;
FLITSCH, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
FLITSCH, R
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1978,
22
(03)
:294
-303
←
1
→
共 2 条
[1]
Johansson G., 1973, Journal of Electron Spectroscopy and Related Phenomena, V2, P295, DOI 10.1016/0368-2048(73)80022-2
[2]
X-RAY PHOTOELECTRON-SPECTROSCOPY OF SIO2-SI INTERFACIAL REGIONS - ULTRATHIN OXIDE-FILMS
[J].
RAIDER, SI
论文数:
0
引用数:
0
h-index:
0
机构:
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
RAIDER, SI
;
FLITSCH, R
论文数:
0
引用数:
0
h-index:
0
机构:
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
IBM,SYST PROD DIV LAB,HOPEWELL JUNCTION,NY 12533
FLITSCH, R
.
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1978,
22
(03)
:294
-303
←
1
→