CONSIDERATION ON CHEMICAL-SHIFT FOR THIN INSULATING FILMS AS MEASURED BY ESCA

被引:8
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IWATA, S
ISHIZAKA, A
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10.2320/jinstmet1952.42.10_1020
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页码:1020 / 1021
页数:2
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[2]   X-RAY PHOTOELECTRON-SPECTROSCOPY OF SIO2-SI INTERFACIAL REGIONS - ULTRATHIN OXIDE-FILMS [J].
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IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1978, 22 (03) :294-303