ELECTRICAL ISOLATION OF RADIOFREQUENCY PLASMA DISCHARGES

被引：53

作者：

MILLER, PA ^{[1
]}

ANDERSON, H ^{[1
]}

SPLICHAL, MP ^{[1
]}

机构：

[1] UNIV NEW MEXICO,DEPT CHEM ENGN,ALBUQUERQUE,NM 87131

来源：

JOURNAL OF APPLIED PHYSICS | 1992年 / 71卷 / 03期

关键词：

D O I：

10.1063/1.351283

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plasmas used for processing of microelectronics materials are often powered by radio-frequency (rf) electrical sources. Such plasmas have nonliner impedance characteristics which cause the plasma state to depend on the nature of the circuitry that supplies electrical power to the plasma. This dependency occurs because the harmonics of the fundamental drive frequency, which are generated by the plasma nonlinearity, interact with the impedance of the external circuitry at the harmonic frequencies. This report describes the successful use of an rf filter in the power feed to the plasma which isolates the plasma electrically and eliminates its sensitivity to changes in the rf generator, cable plant, and matching network.

引用

页码：1171 / 1176

页数：6