MINIATURIZED E-BEAM WRITER -TESTING OF COMPONENTS

被引：9

作者：

STEBLER, C

DESPONT, M

STAUFER, U

机构：

[1] Institute of Physics, University of Basel

来源：

MICROELECTRONIC ENGINEERING | 1995年 / 27卷 / 1-4期

关键词：

Electron beams - Equipment testing - Lenses - Microscopes - Miniature instruments - Scanning tunneling microscopy - Stepping motors;

D O I：

10.1016/0167-9317(94)00078-9

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A new, versatile system for low energy e-beam lithography is presented. It can be operated either as a miniaturized e-beam writer or as a scanning tunneling microscope. Switching between these two modes can be done in-situ due to an exchangeable lens stage. The second key component of the system, the field emission or tunneling tip can also be exchanged in-situ. For positioning of the tip, a new stepper motor for x-, y- and z-alignment is incorporated. Its step size was assessed to be 50 nm and its lowest resonance frequency in z-direction is 6.4 kHz. While operating the system as a microcolumn, an electrostatic scanner allows for +/-4-degrees of deflection of a 400 eV electron beam.

引用

页码：155 / 158

页数：4

共 6 条

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[2] Chang, Kern, McCord, Electron optical performance of a scanning tunneling microscope controlled field emission microlens system, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 6 B, (1989)
[3] Chang, Muray, Staufer, McCord, Kern, SPIE Institutes for Advanced Optical Technologies, IS10, (1993)
[4] Chang, Kern, Muray, Arrayed miniature electron beam columns for high throughput sub-100 nm lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 10 B, (1992)
[5] Pan, Bull. Am. Phys. Soc., 37, (1992)
[6] Behler, Ph.D. Thesis, (1994)

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