A MATRIX-ISOLATION STUDY OF THE CLOO RADICAL

被引：42

作者：

JOHNSSON, K

ENGDAHL, A

NELANDER, B

机构：

[1] LUND UNIV, CTR CHEM, POB 124, S-22100 LUND, SWEDEN

[2] LINKOPING INST TECHNOL, DEPT PHYS & MEASURMENT TECHNOL, S-58183 LINKOPING, SWEDEN

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1993年 / 97卷 / 38期

关键词：

D O I：

10.1021/j100140a013

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The IR and UV spectra of the ClOO radical, in argon matrices, have been measured. ClOO has a low-wavenumber fundamental at 192.4 cm-1. The UV and IR data have been combined and used to estimate the IR intensities of the ClOO bands. The wavelength dependency of the photochemistry of OClO and ClOO in argon matrices has been studied.

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页码：9603 / 9606

页数：4

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