CHARACTERIZATION OF BURST NOISE IN SILICON DEVICES

被引:23
作者
HSU, ST
WHITTIER, RJ
机构
[1] Fairchild Semiconductor, Research and Development Laboratory, Palo Alto
关键词
D O I
10.1016/0038-1101(69)90044-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Burst noise has been investigated in forward-biased silicon diodes and transistors. To separate surface effects from bulk effects, measurements were performed on gate-controlled devices. Both gate-voltage-dependent and gate-voltage-independent burst noise were observed. Burst noise under forward bias conditions has been characterized in terms of the bias across the p-n junction. From this characterization simple equivalent circuits are presented for diodes and bipolar transistors which model the main features of burst noise in these devices. Analytical expressions for the burst noise spectral distributions are developed and compared with experiment. © 1969.
引用
收藏
页码:867 / &
相关论文
共 19 条
[1]  
BELL DA, 1960, ELECTRICAL NOISE, P258
[2]  
Card W. H., 1963, 2 S PHYS FAIL, P268
[3]   CHARACTERISTICS OF BURST NOISE [J].
CARD, WH ;
CHAUDHARI, PK .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1965, 53 (06) :652-+
[4]   MICROPLASMA FLUCTUATIONS IN SILICON [J].
CHAMPLIN, KS .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (07) :1039-1050
[5]  
GIRALT G, 1965, CR HEBD ACAD SCI, V261, P5350
[6]  
GIRALT G, 1966, ELECTRON LETT, V2, P228
[7]   SURFACE EFFECTS ON P-N JUNCTIONS - CHARACTERISTICS OF SURFACE SPACE-CHARGE REGIONS UNDER NON-EQUILIBRIUM CONDITIONS [J].
GROVE, AS ;
FITZGERALD, DJ .
SOLID-STATE ELECTRONICS, 1966, 9 (08) :783-+
[8]  
GROVE AS, 1965, IEEE T ELECTRON DEV, VED12, P619
[9]  
GROVE AS, 1967, PHYS TECHNOL S, pCH10
[10]   MODEL FOR ELECTRICAL BEHAVIOR OF MICROPLASMA [J].
HAITZ, RH .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (05) :1370-&