APPLICATION OF MOSSBAUER-EFFECT TO STUDY OF ELASTIC AND INELASTIC-SCATTERING OF GAMMA-RAYS IN AMORPHOUS SIO2

被引：9

作者：

ALBANESE, G

GHEZZI, C

机构：

[1] UNIV PARMA,IST FIS,PARMA,ITALY

[2] CNR,LAB MASPEC,PARMA,ITALY

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1974年 / 22卷 / 01期

关键词：

D O I：

10.1002/pssa.2210220124

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：209 / 217

页数：9

共 13 条

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[8] DETERMINATION OF THERMAL DIFFUSE SCATTERING IN A SILICON CRYSTAL BY MEANS OF MOSSBAUER EFFECT [J].

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