INTERSTITIAL DISSOLUTION AND DIFFUSION IN METALLIC SYSTEMS

被引：16

作者：

ANTHONY, TR

MILLER, JW

TURNBULL, D

机构：

[1] General Electric Research and Development Center Schenectady, NY

[2] Division of Engineering and Applied Physics, Harvard University, Cambridge, MA

来源：

SCRIPTA METALLURGICA | 1969年 / 3卷 / 03期

关键词：

D O I：

10.1016/0036-9748(69)90282-8

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

[No abstract available]

引用

页码：183 / &

共 21 条

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[2] ON THEORY OF INTERSTITIAL SOLUTIONS OF NOBLE METALS IN LEAD TIN THALLIUM INDIUM AND CADMIUM - (T) [J].

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APPLIED PHYSICS LETTERS, 1966, 8 (05) :120-&

[3] DIFFUSION OF GOLD AND SILVER IN THALLIUM [J].

ANTHONY, TR ;

DYSON, BF ;

TURNBULL, D .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (03) :1391-&

[4] PRESSURE DEPENDENCE OF INTERSTITIAL-SUBSTITUTIAL DISSOCIATIVE DIFFUSION [J].

ANTHONY, TR ;

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[5]

ANTHONY TR, 1968, P INT C VACANCIES IN

[6]

ANTHONY TR, 1969, VACANCIES INTERSTITI

[7] DIFFUSION OF GOLD IN SODIUM [J].

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MUNDY, JN ;

SMITH, FA .

PHILOSOPHICAL MAGAZINE, 1966, 14 (132) :1299-&

[8]

Dariel M.P., 1968, P INT C VACANCIES IN, P91

[9]

DEKKER AJ, 1961, SOLID STATE PHYSICS, P63

[10] INTERSTITIAL DIFFUSION OF COPPER AND SILVER IN LEAD [J].

DYSON, BF ;

ANTHONY, T ;

TURNBULL, D .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2370-&

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