SOLID SOLUBILITY OF GE, SI, AND MG IN FE2O3 AND PHOTOELECTRIC BEHAVIOR

被引：59

作者：

SANCHEZ, HL ^{[1
]}

STEINFINK, H ^{[1
]}

WHITE, HS ^{[1
]}

机构：

[1] UNIV TEXAS, DEPT CHEM, AUSTIN, TX 78712 USA

来源：

JOURNAL OF SOLID STATE CHEMISTRY | 1982年 / 41卷 / 01期

关键词：

D O I：

10.1016/0022-4596(82)90038-X

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

引用

收藏

页码：90 / 96

页数：7

相关论文

共 19 条

[1] DIFFERENT PHOTOELECTROCHEMICAL BEHAVIOR OF SINTERED AND FLAME-OXIDIZED FE2O3
CURRAN, JS
GISSLER, W
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (01) : 56 - 59
[2] SURFACE INSTABILITY AND NONSTOICHIOMETRY OF ALPHA-FE2O3
DEWIT, JHW
BROERSMA, AF
STROBAND, M
[J]. JOURNAL OF SOLID STATE CHEMISTRY, 1981, 37 (02) : 242 - 247
[3] ELECTRICAL PROPERTIES OF ALPHA FERRIC OXIDE .1. IMPURE OXIDE
GARDNER, RFG
SWEETT, F
TANNER, DW
[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1963, 24 (10) : 1175 - &
[4] GEIGER GH, 1965, T METALL SOC AIME, V233, P2092
[5] PHOTOCHEMICAL PROPERTIES OF SINTERED IRON(III) OXIDE
GORI, M
GRUNIGER, HR
CALZAFERRI, G
[J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 1980, 10 (03) : 345 - 349
[6] SEMICONDUCTOR ELECTRODES .5. APPLICATION OF CHEMICALLY VAPOR-DEPOSITED IRON-OXIDE FILMS TO PHOTOSENSITIZED ELECTROLYSIS
HARDEE, KL
BARD, AJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (07) : 1024 - 1026
[7] JOB RC, 1978, NTIS C0045466 US DEP
[8] PHOTO-OXIDATION OF WATER AT ALPHA-FE2O3 ELECTRODES
KENNEDY, JH
FRESE, KW
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (05) : 709 - 714
[9] ALPHA-FE2O3 PHOTOANODES DOPED WITH SILICON
KENNEDY, JH
SHINAR, R
ZIEGLER, JP
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (10) : 2307 - 2309
[10] KIMIZUKA N, COMMUNICATION