POSITIVE RESIST IMAGE BY DRY ETCHING - NEW DRY DEVELOPED POSITIVE WORKING SYSTEM FOR ELECTRON-BEAM AND DEEP ULTRAVIOLET LITHOGRAPHY

[1] COANE P, 1986, MICROCIRCUIT ENG, P133

[2] Freyer J. L., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V632, P5, DOI 10.1117/12.963663

[3] FUJITA M, 1988, IEEE J SOLID STATE C, V23

[4] GROBMAN WD, 1978, IEDM WASHINGTON, P58

[5] HIROSE M, 1988, P KTI MICROELECTRONI, P79

[6] IIDA Y, 1984, JPN ANNU REV ELECTR, V13, P287

[7] KLYMKO PW, 1988, P KTI MICROELECTRONI, P209

[8] AN E-BEAM MICROFABRICATION SYSTEM FOR NANOLITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 946 - 949

[9] MACDONALD S, 1987, P AM CHEM S WASHINGT, P350

[10] Orvek K. J., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V771, P281, DOI 10.1117/12.940335

[1] COANE P, 1986, MICROCIRCUIT ENG, P133

[2] Freyer J. L., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V632, P5, DOI 10.1117/12.963663

[3] FUJITA M, 1988, IEEE J SOLID STATE C, V23

[4] GROBMAN WD, 1978, IEDM WASHINGTON, P58

[5] HIROSE M, 1988, P KTI MICROELECTRONI, P79

[6] IIDA Y, 1984, JPN ANNU REV ELECTR, V13, P287

[7] KLYMKO PW, 1988, P KTI MICROELECTRONI, P209

[8] AN E-BEAM MICROFABRICATION SYSTEM FOR NANOLITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 946 - 949

[9] MACDONALD S, 1987, P AM CHEM S WASHINGT, P350

[10] Orvek K. J., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V771, P281, DOI 10.1117/12.940335