LOW-PRESSURE PLASMA DEPOSITION OF SIC-REINFORCED MOSI2

被引：18

作者：

JENG, YL ^{[1
]}

WOLFENSTINE, J ^{[1
]}

LAVERNIA, EJ ^{[1
]}

BAILEY, DE ^{[1
]}

SICKINGER, A ^{[1
]}

机构：

[1] ELECTRO PLASMA INC,IRVINE,CA 92714

来源：

SCRIPTA METALLURGICA ET MATERIALIA | 1993年 / 28卷 / 04期

关键词：

D O I：

10.1016/0956-716X(93)90082-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：453 / 458

页数：6

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