DEPOSITION OF THIN POLYCRYSTALLINE FILMS OF CUPROUS THIOCYANATE ON CONDUCTING GLASS AND PHOTOELECTROCHEMICAL DYE-SENSITIZATION

被引：41

作者：

TENNAKONE, K

KUMARASINGHE, AR

SIRIMANNE, PM

KUMARA, GRR

机构：

[1] Institute of Fundamental Studies, Kandy, Hantana Road

来源：

THIN SOLID FILMS | 1995年 / 261卷 / 1-2期

关键词：

COPPER; DEPOSITION PROCESS; SOLAR CELLS;

D O I：

10.1016/S0040-6090(95)06523-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A method is given for electrochemical deposition of thin polycrystalline films of cuprous thiocyanate (p-type semiconductor, band gap = 3.6 eV) on conducting indium-tin oxide glass. Dye-sensitization of the surface with methyl violet and construction of a photoelectrochemical cell are described. The investigation demonstrates the usefulness of unconventional high band gap semiconductors in studying dye-sensitization.

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页码：307 / 310

页数：4

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