NICKEL PLATING BY PULSE ELECTROLYSIS - TEXTURAL AND MICROSTRUCTURAL MODIFICATIONS DUE TO ADSORPTION-DESORPTION PHENOMENA

被引:107
作者
KOLLIA, C
SPYRELLIS, N
AMBLARD, J
FROMENT, M
MAURIN, G
机构
[1] LAB PHYSICOCHIM RAYONNEMENTS,BATIMENT 350,CTR ORSAY,F-91405 ORSAY,FRANCE
[2] NATL TECH UNIV ATHENS,GEN CHEM LAB,GR-15773 ATHENS,GREECE
[3] UNIV PARIS 06,PHYS LIQUIDES & ELECTROCHIM LAB,F-75252 PARIS 05,FRANCE
关键词
D O I
10.1007/BF01019584
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Nickel growth from an organic-free Watts bath working under d.c. plating conditions is governed by several interfacial inhibitors such as H2, Hads or Ni(OH)2. These inhibitors determine most of the structural or macroscopic properties of the nickel plates. Pulse electrolysis (p.e.) is thus a powerful means of perturbing the adsorption-desorption phenomena occurring at the nickel/electrolyte interface and hence offers an opportunity of preparing deposits exhibiting better properties. Through an analysis of the textural and microstructural changes produced by p.e., we show that molecular inhibitors desorb during the relaxation time, while conversely other inhibitors like Hads or anions are more strongly adsorbed and inhibit the nickel cathodic process. © 1990 Chapman and Hall Ltd.
引用
收藏
页码:1025 / 1032
页数:8
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