MULTI-APERTURE ION-SOURCE WITH A DEFLECTABLE FOCUSED BEAM FOR COMPOSITIONAL CONTROL IN SPUTTER DEPOSITION

被引:8
作者
SMITS, JW
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 03期
关键词
D O I
10.1116/1.571090
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:704 / 708
页数:5
相关论文
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