LASER MICROFABRICATION OF OPTICAL CIRCUITS IN LINBO3

[1] ALFERNESS RC, 1982, IEEE J QUANTUM ELECT, V18, P1807, DOI 10.1109/TMTT.1982.1131323

[2] CHARACTERIZATION OF (TI0.65NB0.35)O2 COMPOUND AS A SOURCE FOR TI DIFFUSION DURING TI-LINBO3 OPTICAL-WAVEGUIDES FABRICATION [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (01) : 62 - 70

[3] BAUERLE D, 1986, CHEM PROCESSING LASE

[4] NEAR-FIELD AND BEAM-WAIST POSITION OF THE SEMICONDUCTOR-LASER WITH A CHANNELED-SUBSTRATE PLANAR STRUCTURE [J]. APPLIED PHYSICS LETTERS, 1980, 37 (03) : 257 - 260

[5] PHOTOREFRACTIVE EFFECT [J]. OPTICAL ENGINEERING, 1978, 17 (05) : 470 - 479

[6] GROSS ME, 1985, BEAM INDUCED CHEM PR, P21

[7] KOROTKY SK, 1987, INTEGRATED OPTICAL C, P169

[8] LASER MICROFABRICATION OF THIN-FILMS .2. [J]. OPTICS AND LASER TECHNOLOGY, 1987, 19 (01) : 19 - 25

[9] MICHELI F, 1987, OPT LASER TECHNOL, V18, P313

[10] MICHELI F, 1987, OPT LASER TECHNOL, V9, P75

[1] ALFERNESS RC, 1982, IEEE J QUANTUM ELECT, V18, P1807, DOI 10.1109/TMTT.1982.1131323

[2] CHARACTERIZATION OF (TI0.65NB0.35)O2 COMPOUND AS A SOURCE FOR TI DIFFUSION DURING TI-LINBO3 OPTICAL-WAVEGUIDES FABRICATION [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (01) : 62 - 70

[3] BAUERLE D, 1986, CHEM PROCESSING LASE

[4] NEAR-FIELD AND BEAM-WAIST POSITION OF THE SEMICONDUCTOR-LASER WITH A CHANNELED-SUBSTRATE PLANAR STRUCTURE [J]. APPLIED PHYSICS LETTERS, 1980, 37 (03) : 257 - 260

[5] PHOTOREFRACTIVE EFFECT [J]. OPTICAL ENGINEERING, 1978, 17 (05) : 470 - 479

[6] GROSS ME, 1985, BEAM INDUCED CHEM PR, P21

[7] KOROTKY SK, 1987, INTEGRATED OPTICAL C, P169

[8] LASER MICROFABRICATION OF THIN-FILMS .2. [J]. OPTICS AND LASER TECHNOLOGY, 1987, 19 (01) : 19 - 25

[9] MICHELI F, 1987, OPT LASER TECHNOL, V18, P313

[10] MICHELI F, 1987, OPT LASER TECHNOL, V9, P75