EDGE-EFFECTS CORRECTION IN DEPTH PROFILES OBTAINED BY ION-BEAM SPUTTERING

被引：13

作者：

TSONG, IST

POWER, GL

HOFFMAN, DW

MAGEE, CW

机构：

[1] FORD MOTOR CO,DEARBORN,MI 48121

[2] RCA LABS,PRINCETON,NJ 08540

来源：

NUCLEAR INSTRUMENTS & METHODS | 1980年 / 168卷 / 1-3期

关键词：

D O I：

10.1016/0029-554X(80)91283-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：399 / 404

页数：6

共 14 条

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[5]

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[6]

HOFFMAN DW, J VAC SCI TECHNOL

[7]

KRIVANEK OL, 1978, PHYSICS SIO2 ITS INT, P356

[8] SECONDARY-ION MASS-SPECTROMETRY AND ITS USE IN DEPTH PROFILING [J].

LIEBL, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :385-391

[9] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J].

MAGEE, CW ;

HARRINGTON, WL ;

HONIG, RE .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) :477-485

[10] STOICHIOMETRY OF SIO2-SI INTERFACIAL REGIONS .1. ULTRATHIN OXIDE-FILMS [J].

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :58-58

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