IDENTIFICATION OF RAPD MARKERS LINKED TO A BLACK LEAF-SPOT RESISTANCE GENE IN CHINESE ELM

被引:21
作者
BENET, H
GURIES, RP
BOURY, S
SMALLEY, EB
机构
[1] UNIV WISCONSIN,DEPT FORESTRY,MADISON,WI 53706
[2] CTR ETUD OCEANOG & BIOL MARINE,CNRS,UPR 4601,F-29680 ROSCOFF,FRANCE
[3] GRP INTERET PUBL PRINCE BRETAGNE BIOTECHNOL,F-29250 ST POL DE LEON,FRANCE
[4] UNIV WISCONSIN,DEPT PLANT PATHOL,MADISON,WI 53706
关键词
ANTHRACNOSE; ELM BLACK LEAF SPOT; DISEASE-RESISTANCE BREEDING; RANDOM AMPLIFIED POLYMORPHIC DNA; BULKED SEGREGANT ANALYSIS;
D O I
10.1007/BF00222923
中图分类号
S3 [农学(农艺学)];
学科分类号
0901 ;
摘要
Black leaf spot (Stegophora ulmea) is a common foliage disease on Chinese (Ulmus parvifolia) and Siberian elms (U. pumila), two species which have been widely used as sources of Dutch-elm disease-resistance genes for interspecific elm hybrids. A dominant gene controlling resistance to black leaf spot was identified in a population derived from self-pollination of a single U. parvifolia tree. Using RAPD markers, in combination with bulked segregant analysis, we have identified three markers linked to this resistance gene. A survey of Chinese-elm hybrids revealed that the same gene is likely to confer a high level of resistance to black leaf spot in interspecific elm hybrids, although other genetic factors may also be involved in the determination of a disease phenotype.
引用
收藏
页码:1068 / 1073
页数:6
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