THE OPTICAL-PROPERTIES OF SIOX FORMED BY HIGH-DOSE SI ION-IMPLANTATION INTO FUSED-SILICA

被引:22
作者
HEIDEMANN, KF
机构
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1982年 / 61卷 / 3-4期
关键词
D O I
10.1080/00337578208229937
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
SIO//X LAYERS WITH CONTINUOUS DEPTH PROFILES OF THE OXYGEN CONCENTRATION ARE FORMED ABOUT 2 ″MU″ M BELOW THE SURFACE BY2 MEV SI ION IMPLANTATION INTO FUSED SILICA. THE DEPTH DISTRIBUTION OF THE CHANGED OPTICAL PROPERTIES IS REVEALED BY HIGH-RESOLUTION REFLECTION AND TRANSMISSION PROFILES MEASURED ACROSS THE BEVELED SURFACE OF THE IRRADIATED SAMPLES. THE UNDERLYING DEPTH PROFILES OF THE REFRACTIVE INDEX AND OF THE EXTINCTION COEFFICIENT ARE EVALUATED FROM REFLECTION AND TRANSMISSION MEASUREMENTS BY A METHOD WHICH IS BASED ON EXACT FORMULAS FOR THE LIGHT PROPAGATION WITHIN CONTINUOUS DEPTH PROFILES OF THE COMPLEX REFRACTIVE INDEX.
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页码:235 / 246
页数:12
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