THE INFLUENCE OF TITANIUM NITRIDE SPUTTER DEPOSITION TEMPERATURE ON SURFACE-HARDENED 2.5-PERCENT SILICON-IRON

被引：5

作者：

ALJAROUDI, MY

HENTZELL, HTG

BENGTSON, A

机构：

[1] LINKOPING UNIV,DEPT PHYS & MEASUREMENT TECHNOL,THIN FILM GRP,S-58183 LINKOPING,SWEDEN

[2] SWEDISH INST MET RES,S-11428 STOCKHOLM,SWEDEN

来源：

THIN SOLID FILMS | 1989年 / 170卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90735-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：293 / 307

页数：15

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