ENHANCED DEPOSITION IN ELECTRON-BEAM TARGETS DUE TO BEAM STAGNATION

被引:14
作者
CLAUSER, MJ [1 ]
MIX, LP [1 ]
POUKEY, JW [1 ]
QUINTENZ, JP [1 ]
TOEPFER, AJ [1 ]
机构
[1] SANDIA LABS,DEPT FUSION RES,ALBUQUERQUE,NM 87115
关键词
D O I
10.1103/PhysRevLett.38.398
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:398 / 401
页数:4
相关论文
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