OPTICAL-PROPERTIES OF GASB-ALSB HETEROSTRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY
被引:7
作者:
LAMBERT, B
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LAMBERT, B
TOUDIC, Y
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TOUDIC, Y
ROUILLARD, Y
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ROUILLARD, Y
BAUDET, M
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BAUDET, M
GUENAIS, B
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GUENAIS, B
DEVEAUD, B
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DEVEAUD, B
VALIENTE, I
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VALIENTE, I
SIMON, JC
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SIMON, JC
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[1] France Telecom, CNET, LAB, 22301 Lannion, BP 40, Route de Trégastel
来源:
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
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1993年
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21卷
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2-3期
关键词:
D O I:
10.1016/0921-5107(93)90345-N
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
In the first part of this paper we discuss the optimization of the growth conditions of molecular beam epitaxy GaSb layers. Then we present preliminary results for GaSb-AlSb multiple quantum wells which have one excitonic absorption line peaking at about 1.5 mu m at room temperature. Finally we present a 10 pair Bragg reflector which shows 97% reflectivity. These preliminary results allow the GaSb-AlSb system to be considered for optoelectronic devices.