CORRELATION BETWEEN ELECTROSTATIC SCAN PATTERN AND LOCAL DOSE NONUNIFORMITIES

被引：10

作者：

GLAWISCHNIG, H

HOERSCHELMANN, K

HOLTSCHMIDT, W

WENZIG, W

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1981年 / 189卷 / 01期

关键词：

D O I：

10.1016/0029-554X(81)90157-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：291 / 294

页数：4

共 7 条

[1]

FREEMAN JH, 1976, I PHYS C SER, V28, P340

[2]

Glawischnig H., 1980, From Electronics to Microelectronics. Fourth European Conference on Electrotechnics-EUROCON'80, P75

[3]

HEMMENT PLF, 1978, I PHYS C SER, V38, P117

[4]

ROSE PH, 1978, I PHYS C SER, V38, P243

[5]

Ryding G., 1975, IEEE Transactions on Manufacturing Technology, VMFT-4, P21, DOI 10.1109/TMFT.1975.1135858

[6]

RYSSEL H, 1978, IONENIMPLANTATION, P124

TURNER, N .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 189 (01) :311-318