THE STUDY OF SUB-SURFACE AND INTERFACE CHARACTERISTICS OF SEMICONDUCTOR HETEROSTRUCTURES BY SLOW POSITRON IMPLANTATION SPECTROSCOPY

被引:10
作者
BAKER, JA
COLEMAN, PG
机构
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D O I
10.1088/0953-8984/1/SB/008
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
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页码:SB39 / SB44
页数:6
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