ELECTRON DIFFRACTION EVIDENCE FOR THE EXISTENCE OF MICROSTRESS IN EVAPORATED METAL FILMS

被引：7

作者：

HALTEMAN, EK

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1952年 / 23卷 / 01期

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D O I：

10.1063/1.1701963

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：150 / 151

页数：2

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