TRIBOLOGICAL CHARACTERISTICS OF AMORPHOUS-CARBON FILMS INVESTIGATED BY POINT CONTACT MICROSCOPY

被引:62
作者
MIYAMOTO, T [1 ]
KANEKO, R [1 ]
MIYAKE, S [1 ]
机构
[1] NIPPON INST TECHNOL, MINAMI SAITAMA, SAITAMA 345, JAPAN
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 02期
关键词
D O I
10.1116/1.585191
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Wear marks and frictional force distribution on amorphous carbon films, fluorinated amorphous carbon films, silicon-containing amorphous carbon films, and fluorinated silicon-containing amorphous carbon films were investigated by point contact microscopy. Film surfaces were also analyzed by x-ray photoelectron spectroscopy. The fluorinated silicon-containing (40%) amorphous carbon film has the highest strength of the tested films. CF4 plasma treatment fluorinated the silicon-containing (40%) amorphous carbon film, and significantly reduced its frictional coefficient to less than 0.3. The surface of fluorinated silicon-containing (40%) amorphous carbon film is composed of carbon, silicon, fluorine, and oxygen. Carbon, silicon, and fluorine show the plural chemical states of SiC and CFx. This increases film strength and enhances the lubricating effect of the fluorinated silicon-containing (40%) amorphous carbon film.
引用
收藏
页码:1336 / 1339
页数:4
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