ANNEALING EFFECTS ON STRUCTURE AND RESISTIVITY OF NI-P FILMS

被引：41

作者：

PAI, ST

BROWN, JD

MARTON, JP

机构：

来源：

关键词：

D O I：

10.1063/1.1661108

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：282 / &

共 16 条

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[2] ELLIOTT RP, 1965, CONSTITUTION BINARY, P874
[3] STRUCTURE OF CHEMICALLY DEPOSITED NICKEL
GOLDENSTEIN, AW
ROSTOKER, W
SCHOSSBERGER, F
GUTZEIT, G
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (02) : 104 - 110
[4] STRUCTURE OF ELECTROLESS NICKEL
GRAHAM, AH
LINDSAY, RW
READ, HJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) : 1200 - 1201
[5] STRUCTURE AND MECHANICAL PROPERTIES OF ELECTROLESS NICKEL
GRAHAM, AH
LINDSAY, RW
READ, HJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) : 401 - &
[6] HEBB EL, 1963, ELECTROCHEM TECH, V1, P217
[7] METASTABLE EVAPORATED THIN FILMS OF CU-AG AND CO-AU ALLOYS .I. OCCURRENCE AND MORPHOLOGY OF PHASES
MADER, S
NOWICK, AS
WIDMER, H
[J]. ACTA METALLURGICA, 1967, 15 (02): : 203 - +
[8] NUCLEATION GROWTH AND STRUCTURE OF THIN NI-P FILMS
MARTON, JP
SCHLESINGER, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (01) : 16 - +
[9] MARTON JP, UNPUBLISHED
[10] NEUGEBAUER CA, 1959, STRUCTURE PROPERTIES, P253