FIELD-EMISSION DEPOSITION SOURCES

被引：5

作者：

CLAMPITT, R ^{[1
]}

机构：

[1] UKAEA,CULHAM LAB,ABINGDON OX14 3DB,OXFORDSHIRE,ENGLAND

来源：

THIN SOLID FILMS | 1979年 / 58卷 / 01期

关键词：

D O I：

10.1016/0040-6090(79)90224-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new metal ion deposition process, field emission deposition, is described in which ions, clusters and droplets are extracted directly from the melt by an electric field. Films deposited in this way exhibit interesting physical, metallurgical and electrical properties. © 1979.

引用

页码：129 / 132

页数：4