C-ADSORPTION BEHAVIOR OF THIN FLUORIDE FILMS

被引：9

作者：

KAISER, U ^{[1
]}

KAISER, N ^{[1
]}

机构：

[1] FRAUNHOFER EINRICHTUNG ANGEW OPT & FEINMECH,O-6900 JENA,GERMANY

来源：

THIN SOLID FILMS | 1994年 / 237卷 / 1-2期

关键词：

Thin films;

D O I：

10.1016/0040-6090(94)90269-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The adsorption behaviour of physically vapour deposited MgF2, LaF3, CaF2, and LiF films on non-heated substrates has been investigated gravimetrically and spectroscopically. It was also shown that the adsorption behaviour differs between the two growth groups into which the fluorides are divided. The strong adsorption of saturated hydrocarbons in CaF2 and LiF films, measured by Fourier transform infrared spectroscopy after maintaining for two years at atmospheric pressure, can be explained by calculation of the water filling degree of the pores and with the assumption of a pore size distribution of the film pores.

引用

页码：250 / 254

页数：5

共 9 条

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[5]

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[8]

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[9]

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