Microstructuring by nanoparticle impact lithography

被引：15

作者：

Gspann, J ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM KARLSRUHE, INST MIKROSTRUKTURTECH, D-76021 KARLSRUHE, GERMANY

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1995年 / 51卷 / 01期

关键词：

nanoparticle; impact; microlithography;

D O I：

10.1016/0924-4247(96)80049-5

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Hypervelocity impacts of nanoparticles are used for eroding surface area selectively via shadow masks in contact or in proximity to the target surface. By atomic force microscopy, the impacted surfaces have been found to show about 20 nm depth in silicon after 0.1 s of bombardment at impact energies of the order of 100 keV. Prolonged erosion of the targets by nanoparticle bombardment leads to smoothened eroded surfaces, e.g. of CVD diamond. The nanoparticle material can be chosen to react under the impact locally with the target to generate volatile products.

引用

页码：37 / 39

页数：3