LAYER-BY-LAYER GROWTH OF CUPRATE THIN-FILMS BY PULSED-LASER DEPOSITION

被引:11
作者
GUPTA, A
CHERN, MY
HUSSEY, BW
机构
[1] IBM T. J. Watson Research Center, Yorktown Heights
来源
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 1993年 / 209卷 / 1-3期
关键词
D O I
10.1016/0921-4534(93)90899-2
中图分类号
O59 [应用物理学];
学科分类号
摘要
The pulsed laser deposition technique has been used to deposit, in a layer-by-layer growth mode, superconducting cuprate thin films on (100) SrTiO3 substrates. The films are deposited using a combination of pulsed O2 jet and a continuous source of atomic O, with the average background pressure maintained as low as 1 mTorr. This permits the in-situ monitoring of the growth process using reflection high-energy electron diffraction (RHEED). Before growth of the cuprate films, a thin SrTiO3 buffer layer is homoepitaxially deposited on the substrate to provide an atomically smooth surface. On a smooth surface, the growth of SrTiO3 occurs in a layer-by-layer mode as indicated by the intensity oscillations of the specular spot in the RHEED pattern. Subsequent layer-by-layer growth of a variety of cuprate films, including YBa2Cu3O7-delta (YBCO), La1.85Sr0.15CuO4 (LSCO), Nd1.85Ce0.15CuO4 (NCCO), and SrCuO2 (SCO), has been achieved under appropriate deposition conditions.
引用
收藏
页码:175 / 178
页数:4
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