NEW ELECTRON-BEAM PUMPED XEF-LASER AT 486-NM

被引:29
作者
ERNST, WE
TITTEL, FK
机构
[1] Electrical Engineering Department, Rice University, Houston
关键词
D O I
10.1063/1.90909
中图分类号
O59 [应用物理学];
学科分类号
摘要
Laser emission has been observed from XeF on the C (3/2) →A (3/2) transition at 486 nm with a spectral bandwidth of 12 nm. A peak laser power of 5 kW was obtained from Ar/Xe/NF3 mixtures in the ratio of 600: 2: 1 at total pressures of 350-800 kPa excited by 1-MeV 20-kA electron-beam pulses of 8-ns duration. Lasing can also occur on the usual B (1/2) →X (1/2) transition at 353 nm with an appropriate set of cavity reflectors under the same operating conditions.
引用
收藏
页码:36 / 37
页数:2
相关论文
共 8 条
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