DECOMPOSITION OF TRIMETHYLALUMINUM AND N2O ON SI SURFACES USING ULTRAVIOLET-LASER PHOTOLYSIS TO PRODUCE AL2O3 FILMS

被引：14

作者：

ISHIDA, M ^{[1
]}

ETO, A ^{[1
]}

NAKAMURA, T ^{[1
]}

SUZAKI, T ^{[1
]}

机构：

[1] TOYOKO KAGAKU CO LTD,NAKAHARA KU,KAWASAKI 211,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 05期

关键词：

D O I：

10.1116/1.576170

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2931 / 2934

页数：4

共 15 条

[1] THE PROTOTYPE ALUMINUM-CARBON SINGLE, DOUBLE, AND TRIPLE BONDS - AL-CH3, AL=CH2, AND AL=CH [J].

FOX, DJ ;

RAY, D ;

RUBESIN, PC ;

SCHAEFER, HF .

JOURNAL OF CHEMICAL PHYSICS, 1980, 73 (07) :3246-3254

[2] DEPOSITION OF A SI MONOLAYER ON SAPPHIRE USING AN ARF EXCIMER LASER FOR SI EPITAXIAL-GROWTH [J].

ISHIDA, M ;

TANAKA, H ;

SAWADA, K ;

NAMIKI, A ;

NAKAMURA, T ;

OHTAKE, N .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (04) :2087-2091

[3] EPITAXIAL AL2O3 FILMS ON SI BY LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION [J].

ISHIDA, M ;

KATAKABE, I ;

NAKAMURA, T ;

OHTAKE, N .

APPLIED PHYSICS LETTERS, 1988, 52 (16) :1326-1328

[4] SI-SIO2 INTERFACE CHARACTERIZATION BY ESCA [J].

ISHIZAKA, A ;

IWATA, S ;

KAMIGAKI, Y .

SURFACE SCIENCE, 1979, 84 (02) :355-374

[5] CHARACTERIZATION OF BETA-SIC SURFACES AND THE AU/SIC INTERFACE [J].

MIZOKAWA, Y ;

GEIB, KM ;

WILMSEN, CW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :1696-1700

[6] MECHANISMS OF AL FILM GROWTH BY ULTRAVIOLET-LASER PHOTOLYSIS OF TRIMETHYLALUMINUM [J].

MOTOOKA, T ;

GORBATKIN, S ;

LUBBEN, D ;

ERES, D ;

GREENE, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :3146-3152

[7] METALORGANIC MOLECULAR-BEAM EPITAXY OF GAMMA-AL2O3 FILMS ON SI AT LOW GROWTH TEMPERATURES [J].

SAWADA, K ;

ISHIDA, M ;

NAKAMURA, T ;

OHTAKE, N .

APPLIED PHYSICS LETTERS, 1988, 52 (20) :1672-1674

[8]

Seah M. P., 1979, Surface and Interface Analysis, V1, P2, DOI 10.1002/sia.740010103

[9] CHARACTERIZATION OF THE TREATED SURFACES OF SILICON ALLOYED PYROLYTIC CARBON AND SIC [J].

SMITH, KL ;

BLACK, KM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :744-747

[10] PHOTODEPOSITION OF ALUMINUM-OXIDE AND ALUMINUM THIN-FILMS [J].

SOLANKI, R ;

RITCHIE, WH ;

COLLINS, GJ .

APPLIED PHYSICS LETTERS, 1983, 43 (05) :454-456

← 1 2 →