FERROMAGNETIC-RESONANCE OF NICKEL THIN-FILMS INFLUENCED BY H-2 AND CO ADSORPTION

被引:8
作者
BLUM, JK [1 ]
GOPEL, W [1 ]
机构
[1] TECH UNIV HANOVER,INST PHYS CHEM,D-3000 HANOVER,FED REP GER
关键词
D O I
10.1016/0304-8853(77)90106-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:186 / 191
页数:6
相关论文
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