PHOTOELECTROCHEMICAL PROPERTIES OF THIN GAMMA-FE203 FILMS FORMED BY MO-CVD TECHNIQUE

被引：6

作者：

HARA, N

SUGIMOTO, K

机构：

来源：

JOURNAL OF THE JAPAN INSTITUTE OF METALS | 1988年 / 52卷 / 02期

关键词：

D O I：

10.2320/jinstmet1952.52.2_189

中图分类号：

学科分类号：

摘要：

引用

页码：189 / 198

页数：10

共 45 条

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