RECENT DEVELOPMENTS IN RADIATION-SENSITIVE GLASSES

被引：20

作者：

STOOKEY, SD

机构：

来源：

INDUSTRIAL AND ENGINEERING CHEMISTRY | 1954年 / 46卷 / 01期

关键词：

D O I：

10.1021/ie50529a052

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

引用

页码：174 / 176

页数：3

相关论文

共 5 条

[1]

SCHULMAN JH, 1950, Patent No. 2524839

[2] PHOTOSENSITIVE GLASS - A NEW PHOTOGRAPHIC MEDIUM [J].

STOOKEY, SD .

INDUSTRIAL AND ENGINEERING CHEMISTRY, 1949, 41 (04) :856-861

[3] CHEMICAL MACHINING OF PHOTOSENSITIVE GLASS [J].

STOOKEY, SD .

INDUSTRIAL AND ENGINEERING CHEMISTRY, 1953, 45 (01) :115-118

[4]

SUN KH, 1952, GLASS IND, V33, P511

[5]

WEYL, 1949, J ELECTROCHEM SOC, V95, P70