FORMATION OF PROTECTIVE FILMS ON IRON-SILICON ALLOYS

被引：28

作者：

BAN, T

BOHNENKAMP, K

ENGELL, HJ

机构：

[1] Max-Planck-Institut für Eisenforschung, Düsseldorf

来源：

CORROSION SCIENCE | 1979年 / 19卷 / 04期

关键词：

D O I：

10.1016/0010-938X(79)90012-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The oxidation of high purity FeSi alloys was studied over the temperature range 765-965°C by means of a micro-balance. In hydrogen with 2.5% water vapour only silicon was oxidized. Specimens with 1% Si showed mostly internal oxidation. External layers of SiO2 formed on specimens with 2 and 3.4% Si. These layers also hindered the oxidation of iron. The oxidation of Fe could be distinguished from oxidation of Si by reduction of the Fe oxides. The low oxidation rates reached at 865° after long times of exposure were ascribed mainly to the oxidation of Si. © 1979.

引用

页码：283 / &

共 11 条

[1]

[Anonymous], 1965, WERKSTOFFE KORROSION

[2]

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[3]

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[4]

ENGELL HJ, 1959, Z ELEKTROCHEM, V63, P835

[5]

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[6]

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[7]

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[8]

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[9]

SCHMAHL NG, 1963, ARCH EISENHUTTENWES, V34, P115

[10] INFLUENCE OF SILICON ON OXIDATION PROPERTIES OF IRON [J].

SVEDUNG, I ;

VANNERBERG, NG .

CORROSION SCIENCE, 1974, 14 (06) :391-+

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