THERMAL MICROTRANSDUCERS BY CMOS TECHNOLOGY COMBINED WITH MICROMACHINING

被引：5

作者：

BALTES, H

MOSER, D

LENGGENHAGER, R

BRAND, O

机构：

[1] Physical Electronics Laboratory, ETH Zurich, CH-8093 Zurich, Switzerland microtransducers realized by industrial IC CMOS technology combined with subsequent maskless anisotropic wet etching. Examples include a thermally excited beam resonator, resistive an

来源：

MICROELECTRONIC ENGINEERING | 1991年 / 15卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(91)90255-C

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report the design, fabrication and characterization of thermomechanical microtransducers realized by industrial IC CMOS technology combined with subsequent maskless anisotropic wet etching. Examples include a thermally excited beam resonator, resistive and thermoelectric gas flow sensors, and a thermoelectric power sensor.

引用

页码：419 / 422

页数：4